Photolithography for micro-electronics.

Micro-layered-photolithography for Micro- Fabrication and Micro-molding

A novel process based on the principle of layered photolithography has been proposed and tested for making three-dimensional micro-structures. An experimental setup was designed and built for doing experiments on this micro-fabrication process. An ultraviolet (UV) excimer laser at the wavelength of 248 nm was used as the light source and a single piece of photo-mask carrying a series of two dim...

Micro- and Nano-Electronics Group

High Heat Flux Micro - Electronics Cooling

The temperature of an electronics device rises fairly linearly with increasing device heat flux. This relationship is especially problematic for defense electronics, where heat dissipation is projected to exceed 1000W/cm in the near future. This paper study explored the benefit of cooling the electronics device using indirect refrigeration cooling system .In this system the heat sink in a prima...

Technologies and Materials for Micro and Nano-electronics

In the article technologies used in micro and nanoelectronics there are shortly described. Attention is devoted to lithography as a basic technology. Principles of electron and ion lithography are mentioned as well as progressive ion projection lithography. Some remarks to nanotubes as means of cold cathodes for vacuum electron tubes for nanoelectronics are presented.

Buenos Aires – Octubre 2007 Micro - and Nano - NDE for Micro - Electronics ( back end )

Advanced techniques for nondestructive evaluation (NDE), having volume resolutions better than 1 micrometer voxel (three dimensional pixel) size, are urgently needed for the safety and reliability of electronic systems, especially those used in extended life applications. This paper presents the current status and future vision of sub-nanometer NDE. Techniques like acousticand X-ray microscopy,...